CALCULATION OF COVERAGE AND FLAKE SIZE OF MONOLAYERS GROWN BY CHEMICAL VAPOR DEPOSITION TECHNIQUE

Abstract

Two-dimensional (2D) materials such as transition metal dichalcogenides (TMDs) are prominentcandidates to be utilized in integrated circuits. However, growing uniform and large-area 2D materials,specifically monolayers, that can be used in electronic component production is still one of the mainchallenges for these 2D materials to be incorporated in integrated circuits or other active deviceapplications. The aim of this study is to demonstrate a practical and reliable MATLAB computationalmethod, which calculates the ratio of the chemical vapor deposited monolayers to the whole substratesurface and the maximum area of the deposited flakes. In this study, we used the K-means clustering methodto calculate surface coverage where we obtained accuracy of ~96% for the simple test images (single starand hexagonal shapes). For the multi-numbered and distributed shapes example, we achieved higheraccuracy of ~98%. We also realized calculation of each flake area with ~99% accuracy indicating the flakewith the maximum area. The practical calculation of the surface coverage ratio and flake size will allow foreasy identification of the effects of the process parameters during novel material growth, which will paveway for future optoelectronic and electronic devices.